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MÁY QUANG PHỔ HITACHI UH4150

Brand: Hitachi
Product Code: UH4150
Availability: In Stock
Price: Contact price
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Quang phổ UV-VIS-NIR (Near Infrared Reflectance) là kỹ thuật dùng    để kiểm soát chất lượng, nghiên cứu khoa học;  dùng để xác định thành phần hóa học trong các mẫu nguyên liệu, vật liệu bán dẫn, hoá chất, thực phẩm, dược phẩm... .... dựa trên sự hấp thụ bức xạ điện từ trong phạm vi bước sóng từ 185nm - 3300nm. Những giá trị phổ thu được sẽ được phân tích bằng phần mềm máy tính và cho ra một ma trận các giá trị của phổ chất cần phân tích 

UV-VIS-NIR Spectrophotometer:

Manufacturer : Hitachi – Japan

Model: UH4150

UH4150 Spectrophotometer 

Integrating sphere

Including UV Solutions Program.

Standard equipment:

User’s manual for  operations & maintenance

UV Solutions program (CD-R)       

Models UH4150, the experts in solid state spectrophotometry, allow configuring a system to meet a variety of measurement needs by combining accessories appropriate to the application objectives.

Standard Integrating Sphere (for total reflectance)

·         60mm Std IS for Total Reflect, 60 mm Standard Integrating Sphere, for total reflectance, BaSO4, 240 - 2600 nm

·         Internal coating material : BaSO4, Sub white plate: Al2O3, Number of ports : 4, Port inclination angle : Sample side; 10˚, reference side; 10˚

·         Wavelength range: 240 – 2,600 nm

·         Baseline flatness:  ± 0.002 Abs (240 - 2,200 nm)

                              ± 0.004 Abs (2,200 - 2,600 nm)  

 

SPECIFICATIONS:

·         Detector: 60mm Std IS for Total/Diffuse Reflect, 60 mm Standard Integrating Sphere, for both total reflectance and diffuse reflectance, BaSO4, 240 – 2,600 nm

·         Setting wavelength range: 175 – 3,300 nm

·         Measuring wavelength range: 240 – 2,600 nm

·         Monochromator: Prism-Grating, Double monochromator; Pre-monochromator: Littrow monochromator using a prism, Main monochromator: Czerny-Turner monochromator using Diffraction grating (2 switchable diffraction gratings)

·         Sample compartment: Sample compartment located on the table top and constructed to allow large samples; Interior dimensions: 680 (W) × 470 (D) × 300 (H) mm, Light beam path length: 200 mm

·         Wavelength indication: In units of 0.01 nm

·         Slit width indication: UV and visible regions: Automatic control, and selection of a slit width from 0.01 to 2.4 nm in increments of 0.01 nm and from 2.4 to 8.0 nm in increments of 0.02 nm; Near infrared region: Automatic control, and selection of a slit width from 0.1 to 20.0 nm in increments of 0.1 nm

·         Wavelength accuracy: UV and visible regions: ± 0.2 nm, Near infrared region: ± 1.0 nm, Automatic wavelength calibration function is incorporated

·         Wavelength setting repeatability: UV and visible regions: ± 0.1 nm, Near infrared region: ± 0.5 nm

·         Wavelength scan speed: Visible region: 0.3, 3, 15, 30, 60, 120, 300, 600, 1,200, and 2,400; Near infrared region: 0.75, 7.5, 37.5, 75, 150, 300, 750, 1,200, 1,500, 3,000, and 6,000; Go to λ: 3,600 nm/min (9,000 nm/min for near infrared region)

·         Light source: UV region: Deuterium lamp (mountable by one touch), Visible and near infrared regions: 50 W Tungsten-halogen lamp (long life of 1,000 hours)

·         Light source switching wavelength: Automatic switching at a specified wavelength between 325 nm to 370 nm

·         Photometric method: Double beam direct ratio photometry (Measurement of negative absorbance or transmittance/reflectance of more than 100% is possible owing to Hitachi-original differential feedback method); UV and visible regions: Negative voltage control method and slit control method; Near infrared region: slit control method and fixed slit method

·         Photometric mode: Absorbance (Abs), transmittance (%T), reflectance (%R), reference side energy (E(R))/ sample side energy (E(S))

·         Photometric range: Absorbance: -2 to- +5.0 (in units of 0.001 Abs); Transmittance/reflectance: 0 - 999.99 (in units of 0.01%)

·         Photometric accuracy: Certified according to NIST SRM 930: ± 0.002 Abs (0 - 0.5 Abs), ± 0.004 Abs (0.5 - 1.0 Abs), ± 0.3%T

·         Photometric repeatability: Certified according to NIST SRM 930: ± 0.001 Abs (0 - 0.5 Abs), ± 0.002 Abs (0.5 - 1.0 Abs), ± 0.1%T

·         Response: An optimum response is automatically selected under given slit width and wavelength scan-speed.

·         Baseline correction: 5 channels: System baseline: 1 ch; User baseline: 4 ch

·         Baseline flatness (UV-VIS): Less than ± 0.002 Abs (240 - 850 nm, slit width; 4 nm, scan speed; 300 nm/min)

·         Baseline flatness (NIR): Less than ± 0.002 Abs (850 - 2,200 nm, automatic slit width, scan speed; 750 nm/min, PbS sensitivity; 1); Less than ± 0.004 Abs (2,200 - 2,600 nm, automatic slit width, scan speed: 750 nm/min, PbS sensitivity: 1)

·         Noise level: Less than ± 0.00075 Abs (Peak to Peak, 500 nm, slit width: 4 nm, sampling interval: 1 s); Less than ± 0.0005 Abs (Peak to Peak, 1,100 nm, automatic slit width, sampling interval: 1 s, PbS sensitivity: 1)

·         Baseline stability: Two hours later after power-On: Less than 0.0004 Abs/ 60 minutes (340 nm)

·         Data processing unit: PC: OS; Windows® 7 Professional (32 bit or 64 bit)

·         Operating temperature: 15 – 35oC

·         Operating humidity: 25 - 80% (No condensing, 70% or less under temperatures of 30ºC or higher)

·         Physical size (WxDxH): 900 x 760 x 1,180 mm

·         Power supply: 220 – 240V, 50/60Hz

                                                                     

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